Five styles in one image
Source-attributed Nano Banana Pro image prompt from the Awesome Nano Banana Pro Prompts repository with preview image and reuse review notes.
這是一個Portrait Photography的Nano Banana Pro範例。請使用下方可直接使用的提示資訊產生類似的視覺素材，並在重複使用前查看Awesome Nano Banana Pro Prompts署名和商業用途授權資訊。
需要完整的提示符號集？請使用 Portrait Photography 主題中心提供更多相關範例，或打開 Nano Banana Pro 提示庫 有關完整範例索引、可重複使用結構和來源歸屬的資訊。
提示詞
可直接複製的提示
Using the reference image [ref], recreate the exact same subject, pose, proportions, clothing, perspective, lighting direction and all defining details from the reference. The final image must remain a perfect, faithful reinterpretation of the reference, without altering the character’s face, body structure, objects, or composition. Apply five different artistic styles simultaneously by dividing the final result into five equal vertical segments (each 20% of the width). These style segments must be perfectly aligned with the reference composition — the subject and background remain continuous across the entire width of the image. The only difference is the applied style in each vertical zone. Style layout (left → right): Cyberpunk (20%) Neon glows, holographic light, reflective surfaces, futuristic color palette. Cartoon (20%) Simplified shapes, bold outlines, vibrant colors, expressive cute rendering. Cinematic Realism (20%) Film-grade dramatic lighting, ultra-high detail, realistic skin texture and materials. Sketch (20%) Pencil or ink style, visible strokes, cross-hatching, monochrome artistic texture. Watercolor (20%) Soft pigment bleeding, transparent washes, pastel tones, textured paper feel. Requirements: — Strictly preserve the reference appearance with no alterations. — The scene must stay unified and aligned across all styles. — Clean, sharp vertical boundaries between style zones. — No style blending or mixing across the borders. — High-resolution, sharp and accurate rendering.
此類案例更多
按類別、輸入模式相容性、品質和低風險進行優先排序。
重用和來源註釋
預覽案例後，請謹慎使用此提示。
- 1.複製提示或直接在 Dovoo 中使用生成按鈕開啟提示。
- 2.根據您的實際使用情況調整變數、寬高比和參考影像。
- 3.發布或付費使用前，請確認版權、署名要求以及品牌或肖像權風險。